Development the obtaining technology of highest manganese silicide films for thermoelectric microelectric devices
B. Z. SharipovД. М. ШукуроваM.E. AzimovT. S. KamilovTashkent State Technical University, Tashkent (Uzbekistan)Andrey OrekhovV. V. KlechkovskayaRAS, Institute of Crystallography, Moscow (Russian Federation)
2010en
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ABI
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