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Ish: The Effect of Stepwise Postimplantation Annealing on the Composition and Structure of Silicon Surface Layers Implanted with Alkali Metal Ions
Formation of nanodimensional structures on surfaces of GaAs and Si by means of ion implantation
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MaqolaInorganic Fluorides and Related CompoundsNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms200016 iqtibosABIStructure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing
Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков
MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 iqtibosABIIon-beam-induced amorphization and recrystallization in silicon
Lourdes Pelaz, Luis A. Marqués, J. Barbolla
Maqola20043 iqtibosABISemiconductor lasers with internal wavelength selection
V. V. Zolotarev, A. Yu. Leshko, A. V. Lyutetskiĭ +10
Maqola20133 iqtibosABISolar cell efficiency tables (version 49)
Martin A. Green, Keith Emery, Yoshihiro Hishikawa +4
Maqola20163 iqtibosABI