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Work: Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by ${\text{O}}_{2}^{ + }$ Ion Implantation
Applying low-energy ion implantation in the creation of nanocontacts on the surface of ultrathin semiconductor films
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ArticleIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201314 citationsABI