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Работ: 5
Работа: Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Study of the Composition of Uncontrolled Impurities and the Profiles of Their Distribution at the Ni–CdS Interface
A. A. Abduvayitov, Kh. Kh. Boltaev, G. A. Rozikov
СтатьяChalcogenide Semiconductor Thin FilmsJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2022Цитирований: 0ABI