Kh. Kh. Boltaev
Работ: 11
Tashkent State Technical University, Universitetskaya ul. 2, Tashkent, 100095, Uzbekistan
Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing
Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков
СтатьяSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2014Цитирований: 14ABIInfluence of ion bombardment on the profile of the depth distribution of impurity atoms in Si used for solar cells and diode structures
Б. Е. Умирзаков, S. J. Nimatov, Kh. Kh. Boltaev
СтатьяSilicon and Solar Cell TechnologiesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2014Цитирований: 8ABIStudy of the Composition of Uncontrolled Impurities and the Profiles of Their Distribution at the Ni–CdS Interface
A. A. Abduvayitov, Kh. Kh. Boltaev, G. A. Rozikov
СтатьяChalcogenide Semiconductor Thin FilmsJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2022Цитирований: 0ABI