Работы, цитирующие эту работу

Работ: 5

Работа: Control of the formation of ultrathin CoSi2 layers during the rapid thermal annealing of Ti/Co/Ti/Si(100) structures

1. On the synthesis of nanoscale phases of metal silicides in the near-surface region of silicon and the study of their electronic structures by passing light

   Y. S. Ergashov, Д. А. Ташмухамедова, Б. Е. Умирзаков

   СтатьяSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2017Цитирований: 21

   ABIABI:AkademIndex/openalex/2026.other.104961

2. Energy spectra of SiO2 nanofilms formed on a silicon surface by ion implantation

   Y. S. Ergashov, Д. А. Ташмухамедова, Э. А. Раббимов

   СтатьяIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2015Цитирований: 16

   ABIABI:AkademIndex/openalex/2026.other.104958

3. Emission and optical properties of SiO2/Si thin films

   Д. А. Ташмухамедова, M. B. Yusupjanova

   СтатьяSilicon Nanostructures and PhotoluminescenceJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2016Цитирований: 6

   ABIABI:AkademIndex/openalex/2016.article.000134

4. Electronic and Optical Properties of NiSi2/Si Nanofilms

   Б. Е. Умирзаков, Д. А. Ташмухамедова, A. K. Tashatov +1

   СтатьяSurface and Thin Film PhenomenaTechnical Physics2019Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.402216

5. On the Band-Gap Width of NiSi2 Nanocrystals Created in the Surface Region of Si Using Ion Implantation

   N. M. Mustafoeva, A. K. Tashatov, Б. Е. Умирзаков

   СтатьяSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2023Цитирований: 0

   ABIABI:AkademIndex/openalex/2023.article.007102