Работы, цитирующие эту работу

Работ: 2

Работа: Barrier heights and silicide formation for Ni, Pd, and Pt on silicon

1. Effect of different chemical treatments of surface on the height of Al-p-SiGe and Au-n-SiGe barriers

   I. G. Atabaev, N. A. Matchanov, M. U. Hajiev +2

   СтатьяSemiconductor materials and devicesSemiconductors2010Цитирований: 0

   ABIABI:AkademIndex/openalex/2010.article.000173

2. Effect of surface chemical treatments on Ti-p-Si1 − x Gex and Ni-p-Si1 − x Ge x contact properties

   I. G. Atabaev, M. U. Hajiev, N. A. Matchanov +2

   СтатьяSemiconductor materials and interfacesSemiconductors2010Цитирований: 0

   ABIABI:AkademIndex/openalex/2010.article.000362