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Иш: The Effect of Stepwise Postimplantation Annealing on the Composition and Structure of Silicon Surface Layers Implanted with Alkali Metal Ions
Formation of nanodimensional structures on surfaces of GaAs and Si by means of ion implantation
S. B. Donaev, Flyura Djurabekova, Д. А. Ташмухамедова +1
МақолаIon-surface interactions and analysisPhysica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics201420 иқтибосABIElectronic structure and optical properties of CaF2 films under low energy Ba+ ion-implantation combined with annealing
Б. Е. Умирзаков, T.S. Pugacheva, A.T. Tashatov +1
МақолаInorganic Fluorides and Related CompoundsNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms200016 иқтибосABIStructure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing
Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков
МақолаSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 иқтибосABIIon-beam-induced amorphization and recrystallization in silicon
Lourdes Pelaz, Luis A. Marqués, J. Barbolla
Мақола20043 иқтибосABISemiconductor lasers with internal wavelength selection
V. V. Zolotarev, A. Yu. Leshko, A. V. Lyutetskiĭ +10
Мақола20133 иқтибосABISolar cell efficiency tables (version 49)
Martin A. Green, Keith Emery, Yoshihiro Hishikawa +4
Мақола20163 иқтибосABI