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Ish: Studies of Implantation of O+ Ions into SiO2(001) Films at the Small-Angle Ion Bombardment
Applying low-energy ion implantation in the creation of nanocontacts on the surface of ultrathin semiconductor films
D. M. Muradkabilov, Д. А. Ташмухамедова, Б. Е. Умирзаков
MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201314 iqtibosABIResearch of the Impact of Silicon Doping with Holmium on its Structure and Properties Using Raman Scattering Spectroscopy Methods
Sharifa B. Utamuradova, Shakhrukh Kh. Daliev, Alisher Khaitbaev +3
MaqolaOchiq kirishSilicon Nanostructures and PhotoluminescenceEast European Journal of Physics20248 iqtibosABI