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7 ta ish

Ish: Effect of Ar+-ion bombardment on the composition and structure of the surface of CoSi2/Si(111) nanofilms

  1. Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing

    Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков

    MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 iqtibos
    ABI

  2. Estimation of changes in parameters of a crystal lattice and energy bands upon variation in the size of nanocrystals and nanofilms of silicides prepared by ion implantation

    Б. Е. Умирзаков, Д. А. Ташмухамедова, Kh. Kh. Kurbanov

    MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201112 iqtibos
    ABI

  3. Features of CoSi2 phase formation by two-stage rapid thermal annealing of Ti/Co/Ti/Si(100) structures

    V. I. Rudakov, Yu. I. Denisenko, В. В. Наумов +1

    Maqola20119 iqtibos
    ABI

  4. Photoelectron Si 2p spectra of ultrathin CoSi2 layers formed on Si(100)2×1

    M. V. Gomoyunova, I. I. Pronin, N. R. Gall +2

    Maqola20039 iqtibos
    ABI

  5. CoSi 2 -coated Si nanocrystal memory

    Bei Li, Jianlin Liu

    Maqola20097 iqtibos
    ABI

  6. Correlation between the size-dependent melting and crystallization temperatures of metal nanoparticles

    N.Yu. Sdobnyakov, S. V. Repchak, V. M. Samsonov +3

    Maqola20113 iqtibos
    ABI

  7. Sarlavhasiz

    Boshqa1 iqtibos
    ABI