← Back to work
Works cited by this work
7 works
Work: Effect of Ar+-ion bombardment on the composition and structure of the surface of CoSi2/Si(111) nanofilms
Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing
Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков
ArticleSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 citationsABIEstimation of changes in parameters of a crystal lattice and energy bands upon variation in the size of nanocrystals and nanofilms of silicides prepared by ion implantation
Б. Е. Умирзаков, Д. А. Ташмухамедова, Kh. Kh. Kurbanov
ArticleSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201112 citationsABIPhotoelectron Si 2p spectra of ultrathin CoSi2 layers formed on Si(100)2×1
M. V. Gomoyunova, I. I. Pronin, N. R. Gall +2
Article20039 citationsABI