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Ish: Peculiarities of the electron structure of nanosized ion-implanted layers in silicon
Structure of МеSi Silicide Films (Me: Li, Rb, K and Cs) According to Electron Microscopy Data and the Diffraction of Slow Electrons
M.T. Normuradov, A. S. Risbaev, J. B. Khujaniyozov +1
MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20202 iqtibosABIInvestigation on the Electronic Structure of Nanosized Barium Monosilicide Films Produced by Low-energy Implantation of Ba<sup>+</sup> Ions in Si
Gunel Imanova, I. R. Bekpulatov
MaqolaSemiconductor materials and interfacesAmerican Journal of Nano Research and Applications20211 iqtibosABI