A. S. Mallaev
Работ: 6
Tashkent State University
Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Б. Э. Эгамбердиев, B. Ch. Holliev, A. S. Mallaev +2
СтатьяSemiconductor materials and interfacesSurface Engineering and Applied Electrochemistry2007Цитирований: 0ABIInvestigation of profiles of the distribution of ion-implanted Mn atoms using the rutherford back scattering method and the influence of thermal annealing on them
Б. Э. Эгамбердиев, Б.Ч. Холлиев, A. S. Mallaev
СтатьяIon-surface interactions and analysisSurface Engineering and Applied Electrochemistry2007Цитирований: 0ABIDISTRIBUTION PROFILES ON THE CRYSTAL STRUCTURE OF THE SURFACE AND AT THE SURFACE OF SILICON DOPED WITH IONS FROM THERMAL ANNEALING OF IRON AND COBALT
Б. Э. Эгамбердиев, Sh. A. Sayfulloev, A. S. Mallaev
СтатьяSemiconductor materials and interfacesJournalNX - A Multidisciplinary Peer Reviewed Journal2021Цитирований: 0ABI