Работы, цитирующие эту работу

Работ: 2

Работа: On the growth of higher manganese silicide films on silicon

1. The Influence of Structural Defects in Silicon on the Formation of Photosensitive Mn4Si7–Si❬Mn❭–Mn4Si7 and Mn4Si7–Si❬Mn❭–M Heterostructures

   T. S. Kamilov, А.С. Рысбаев, V. V. Klechkovskaya +3

   СтатьяSemiconductor materials and interfacesApplied Solar Energy2019Цитирований: 21

   ABIABI:AkademIndex/openalex/2026.other.079743

2. Study of the temperature dependence of the electrophysical and crystal structure of a thin coating of manganese silicide

   B.D. Igamov, A.I. Kamardin, I.R. Bekpulatov +1

   СтатьяSemiconductor materials and interfacesMaterials Today Communications2026Цитирований: 0

   ABIABI:AkademIndex/openalex/2026.article.000612