Работы, цитирующие эту работу

Работ: 3

Работа: Studies of formation of silicides and their barrier heights to silicon

1. Role of the silicon dioxide in formation of higher manganese silicide films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +3

   СтатьяAdvanced Thermoelectric Materials and Devices2004Цитирований: 2

   ABIABI:AkademIndex/openalex/2004.article.000220

2. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   СтатьяSemiconductor materials and interfacesTechnical Physics2010Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.199251

3. Study of the temperature dependence of the electrophysical and crystal structure of a thin coating of manganese silicide

   B.D. Igamov, A.I. Kamardin, I.R. Bekpulatov +1

   СтатьяSemiconductor materials and interfacesMaterials Today Communications2026Цитирований: 0

   ABIABI:AkademIndex/openalex/2026.article.000612