Работы, цитирующие эту работу

Работ: 3

1. Nonequilibrium Diffusion of Boron in SiC at Low Temperatures

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   СтатьяSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications2010Цитирований: 5

   ABIABI:AkademIndex/openalex/2026.other.390741

2. Influence of Defects on Low Temperature Diffusion of Boron in SiC

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   СтатьяSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications2011Цитирований: 4

   ABIABI:AkademIndex/openalex/2026.other.390730

3. Activation Energy of the Conductance of p–n-4H-SiC 〈Al〉 Structures Doped with Aluminum by the Method of Low-Temperature Diffusion

   Kh. N. Zhuraev, А. Yusupov, A. G. Gulyamov +3

   СтатьяSilicon Carbide Semiconductor TechnologiesJournal of Engineering Physics and Thermophysics2020Цитирований: 1

   ABIABI:AkademIndex/openalex/2026.other.470164