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AkademIndex

Xizmatlar

J. B. Khujaniyozov

6 ta ish

Islom Karimov nomidagi Toshkent davlat texnika universiteti

AkademScholarda batafsil koʻrsatkichlar

  1. Effect of thermal and laser annealing on the atom distribution profiles in Si(111) implanted with P+ and B+ ions

    А.С. Рысбаев, J. B. Khujaniyozov, I. R. Bekpulatov +2

    MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201712 iqtibos
    ABI

  2. Theoretical Explanation of the Effect of a Decrease in the Si(111) Plasmon Energy during the Implantation of Ions with a Large Dose

    А.С. Рысбаев, J. B. Khujaniyozov, M.T. Normuradov +3

    MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20203 iqtibos
    ABI

  3. Structure of МеSi Silicide Films (Me: Li, Rb, K and Cs) According to Electron Microscopy Data and the Diffraction of Slow Electrons

    M.T. Normuradov, A. S. Risbaev, J. B. Khujaniyozov +1

    MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20202 iqtibos
    ABI

  4. On the Formation of Silicide Films of Metals (Li, Cs, Rb, and Ba) During Ion Implantation in Si and Subsequent Thermal Annealing

    А.С. Рысбаев, M. T. Normurodov, J. B. Khujaniyozov +2

    MaqolaSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20211 iqtibos
    ABI

  5. Modification of structure and properties of semiconductor surface by ion implantation with active metals

    А.С. Рысбаев, Sh.H. Djuraev, A.M. Rahimov +2

    MaqolaMetal and Thin Film MechanicsUzbekiston Fizika Zhurnali20000 iqtibos
    ABI

  6. Composition, structure and properties of WO3 powders obtained by the arc discharge method

    Б. Е. Умирзаков, K.B. Egamberdiyev, Akbarjon Abduvayitov +5

    MaqolaOchiq kirishTransition Metal Oxide NanomaterialsUNEC journal of engineering and applied sciences20260 iqtibos
    ABI