Работы, цитирующие эту работу

Работ: 2

Работа: Formation of higher manganese silicide films on silicon

1. The Influence of Structural Defects in Silicon on the Formation of Photosensitive Mn4Si7–Si❬Mn❭–Mn4Si7 and Mn4Si7–Si❬Mn❭–M Heterostructures

   T. S. Kamilov, А.С. Рысбаев, V. V. Klechkovskaya +3

   СтатьяSemiconductor materials and interfacesApplied Solar Energy2019Цитирований: 21

   ABIABI:AkademIndex/openalex/2026.other.079743

2. Electron microscopy characterization of higher manganese silicide film structure on silicon

   Andrey Orekhov, T. S. Kamilov, Anton S. Orekhov +3

   СтатьяSemiconductor materials and interfacesNanotechnologies in Russia2016Цитирований: 7

   ABIABI:AkademIndex/openalex/2026.other.079735