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Ish: Formation of nanodimensional structures on surfaces of GaAs and Si by means of ion implantation
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Д. А. Ташмухамедова, M. B. Yusupjanova, A. K. Tashatov +1
MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20185 iqtibosABIElectronic Structure of Single-Crystal CaF<sub>2</sub>(111) with Nanoscale Phases of Ca and Si
Yokub Suvonovich Ergahov, B. Umirzakov, Gulmira Khalmuratovna Allayarova
MaqolaOchiq kirishnanoparticles nucleation surface interactionsMaterials Sciences and Applications20181 iqtibosABISTUDYING THE PROPERTIES OF NANOSCALE STRUCTURES CREATED ON THE SURFACE OF THE SI/CU P SYSTEM FILMS SI/CU
MaqolaOchiq kirish20230 iqtibosABI