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Ish: Current Status of Silicon Studies with GexSi1-x Binary Compounds and Possibilities of Their Applications in Electronics
Nickel: A very fast diffuser in silicon
Jeanette Lindroos, David P. Fenning, D. J. Backlund +5
Maqola201317 iqtibosABIPhotovoltaic Properties of Silicon Doped with Manganese and Germanium
Н. Ф. Зикриллаев, Habibjon Kushiev, С. Б. Исамов +2
Maqola20237 iqtibosABIDirect formation of large-scale multi-layered germanene on Si substrate
Hsu‐Sheng Tsai, Yuze Chen, Henry Medina +5
Maqola20153 iqtibosABIThe Diffusion Coefficient of Germanium in Silicon
M. Ogino, Yasuhisa Oana, M. Watanabe
Maqola19823 iqtibosABI