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Ish: Impact of the channel shape, back oxide and gate oxide layers on self-heating in nanoscale JL FINFET
Physical origin of negative differential resistance in SOI transistors
Liam McDaid, Steven Hall, Phil Mellor +2
Maqola19895 iqtibosABISOI versus bulk-silicon nanoscale FinFETs
J.G. Fossum, Zhenming Zhou, L. Mathew +1
Maqola20092 iqtibosABI