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Иш: Changes in the electronic structure of the Si surface as a result of ion implantation
An ion track based approach to nano- and micro-electronics
K. Hoppe, W. R. Fahrner, D. Fink +7
Мақола20089 иқтибосABIInfluence of ion bombardment on the profile of the depth distribution of impurity atoms in Si used for solar cells and diode structures
Б. Е. Умирзаков, S. J. Nimatov, Kh. Kh. Boltaev
МақолаSilicon and Solar Cell TechnologiesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20148 иқтибосABI