Ushbu ishga iqtibos qilgan ishlar

5 ta ish

Ish: Oxide film assisted dopant diffusion in silicon carbide

1. Influence of Defects on Low Temperature Diffusion of Boron in SiC

   I. G. Atabaev, Tojiddin M. Saliev, Dilmurad SAIDOV +5

   MaqolaSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications20114 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.390730

2. Fast Switching 4<i>H</i>-SiC<i> P-i-n</i> Structures Fabricated by Low Temperature Diffusion of Al

   I. G. Atabaev, Kh. N. Juraev, V. A. Pak

   MaqolaSilicon Carbide Semiconductor TechnologiesAdvances in Condensed Matter Physics20174 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.390748

3. Research of <i>p</i>‐<i>i</i>‐<i>n</i> Junctions Based on 4<i>H</i>‐SiC Fabricated by Low‐Temperature Diffusion of Boron

   I. G. Atabaev, Kh. N. Juraev

   MaqolaSilicon Carbide Semiconductor TechnologiesAdvances in Materials Science and Engineering20182 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.390749

4. Spectral Dependence of Optical Absorption of 4<i>H</i>-SiC Doped with Boron and Aluminum

   I. G. Atabaev, Kh. N. Juraev, M. U. Hajiev

   MaqolaSilicon Carbide Semiconductor TechnologiesJournal of Spectroscopy20181 iqtibos

   ABIABI:AkademIndex/openalex/2018.article.000197

5. Activation Energy of the Conductance of p–n-4H-SiC 〈Al〉 Structures Doped with Aluminum by the Method of Low-Temperature Diffusion

   Kh. N. Zhuraev, А. Yusupov, A. G. Gulyamov +3

   MaqolaSilicon Carbide Semiconductor TechnologiesJournal of Engineering Physics and Thermophysics20201 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.470164