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Иш: The dependence of the parameters of energy bands on the depth of the ion-doped layer for Si implanted with ions Ba+
Electronic structure and optical properties of CaF2 films under low energy Ba+ ion-implantation combined with annealing
Б. Е. Умирзаков, T.S. Pugacheva, A.T. Tashatov +1
МақолаInorganic Fluorides and Related CompoundsNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms200016 иқтибосABI